Featuring Nikon's most advanced optics for unparalleled inspection of the latest wafer types.
Nikon Eclipse L300N/L300ND FPD / Wafer Inspection microscopes incorporate Nikon’s renowned CFI60 infinity optics, offering the world’s highest level of optical performance. The enhanced epi-fluorescence function, which enables 365nm UV excitation, is optimal for the inspection of semiconductor resist residues on 300mm wafers and organic electroluminescence displays.
The L300N/L300ND features powerful epi-fluorescence observation capabilities, widening the inspection range-- including 365 nm excitation. Diascopic illumination and various observation methods such as brightfield, darkfield, simple polarizing, and DIC are also possible. This observation versatility is highly beneficial in inspection of semiconductor resist residues and organic electroluminescence displays.
Brightfield observation of wafer pattern
Darkfield observation
DIC observation
Epi-fluorescence observation of organic substance on wafer
The L300ND employs a new light source and advanced optics to provide four times brighter illumination for Diascopic observation.
The new high-intensity 12V-50W halogen illuminator is brighter than that of a standard 12V-100W illuminator.
The new motorized universal nosepiece is three times more durable than conventional models.
Inserting a focusing target in the optical path allows easy and accurate focusing on low-contrast samples, such as bare wafers.
Antistatic coatings have been applied to the body, stage, eyepiece tube and other various controls. These coatings strengthen safeguards against contamination and help prevent damage to samples caused by electrostatic charges, thus contributing to higher yields.
The X-Y fine movement control is positioned close to the operator.
All controls are located near each other, allowing stage movements and focusing to be carried out with ease.
The main control knobs and buttons are located at the front of the microscope for easy access.
Quick and easy microscope operation while viewing samples is possible.
Minimizes fatigue during lengthy observations.
Nikon's NIS-Elements Imaging Software provides optimized workflow observation, image capture, and analysis.
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